Illuminating Extreme Ultraviolet Lithography Mask Defect Printability
Illuminating Extreme Ultraviolet Lithography Mask Defect Printability – A method for detecting defects in an euv lithography mask blank, comprising: In order to provide experimental results. One of the most important challenges in extreme ultraviolet lithography is the need to provide mask blanks free of defects. This work addresses the gap between inspection sensitivity at ...